Hubei Gurun Technology Co., Ltd. is.a.leading photoinitiator manufacturer in China. Gurun is dedicated to the development, production and sales of high-performance UV photoinitiators, new photocuring monomers and oligomers. Their products have a variety of applications including varnish and coatings for wood, plastics and metal for the paint and coating industry.
GR-DVE is a yellowish clear liquid and a vinyl etheric double functional monomer with low toxicity, quick curing speed, no oxygen interference, little shrinkage and strong cure and toughness properties. This product is commonly applied to cationic photocu...voir plus
GR-DVE is a yellowish clear liquid and a vinyl etheric double functional monomer with low toxicity, quick curing speed, no oxygen interference, little shrinkage and strong cure and toughness properties. This product is commonly applied to cationic photocurable coatings, adhesives, elastomers, printing inks and more enabling better photopolymerization performance. voir moins
GR-VE/VP is a yellowish clear liquid and a vinyl ether/allyl cationic/free-radical mixed monomer with low toxicity, quick curing speed, low oxygen interference, little shrinkage and strong cure and toughness properties. This product is commonly applied to...voir plus
GR-VE/VP is a yellowish clear liquid and a vinyl ether/allyl cationic/free-radical mixed monomer with low toxicity, quick curing speed, low oxygen interference, little shrinkage and strong cure and toughness properties. This product is commonly applied to cationic/free-radical photocurable coatings, adhesives, elastomers, printing inks and more enabling better photopolymerization performance. voir moins
GR-VE/A is a yellowish clear liquid and a vinyl ether/acrylyl cationic/free-radical mixed monomer with low toxicity, quick curing speed, low oxygen interference, little shrinkage and strong cure and toughness properties. This product is commonly applied t...voir plus
GR-VE/A is a yellowish clear liquid and a vinyl ether/acrylyl cationic/free-radical mixed monomer with low toxicity, quick curing speed, low oxygen interference, little shrinkage and strong cure and toughness properties. This product is commonly applied to cationic/free-radical photocurable coatings, adhesives, elastomers, printing inks and more enabling better photopolymerization performance. voir moins
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