| DPGDA | Allnex | DPGDA (二丙二醇二丙烯酸酯 ) 是一种二官能团反应性稀释剂，暴露于自由基源中可引发聚合。它尤其适用于需要改善柔韧性和附着力以及良好的防潮性的涂料和油墨 | Request Sample |
| EBECRYL® 225 | Allnex | EBECRYL® 225 is a ten functional aliphatic urethane acrylate. After polymerization, films of EBECRYL® 225 exhibit outstanding surface hardness and low haze development after abrasion. In addition, EBECRYL® 225 does not contain intentionally added organic ...展开 EBECRYL® 225 is a ten functional aliphatic urethane acrylate. After polymerization, films of EBECRYL® 225 exhibit outstanding surface hardness and low haze development after abrasion. In addition, EBECRYL® 225 does not contain intentionally added organic tin compounds, heavy metals or quinones. 收起 | Request Sample |
| EBECRYL® 546 | Allnex | Ebecryl® 546 is a chlorine free UV/EB curable polyester resin diluted with TMPTA (1). It has been specifically designed to provide good adhesion to plastic substrates. Films of Ebecryl® 546 cured by ultraviolet light (UV) or electron beam (EB) result in g...展开 Ebecryl® 546 is a chlorine free UV/EB curable polyester resin diluted with TMPTA (1). It has been specifically designed to provide good adhesion to plastic substrates. Films of Ebecryl® 546 cured by ultraviolet light (UV) or electron beam (EB) result in good hardness. 收起 | Request Sample |
| EBECRYL® 716 | Allnex | EBECRYL® 716 is a chlorine-free inert binder diluted with TMPTA. It has been specifically designed to provide good adhesion to non-corona treated rigid plastic substrates. | Request Sample |
| UCECOAT® 6570 | Allnex | UCECOAT® 6570 is a 3 functional aliphatic urethane acrylate oligomer diluted with 5% water. This water dilutable urethane acrylate is particularly useful in screen inks and varnishes for water based applications; giving good water- and solvent resistance ...展开 UCECOAT® 6570 is a 3 functional aliphatic urethane acrylate oligomer diluted with 5% water. This water dilutable urethane acrylate is particularly useful in screen inks and varnishes for water based applications; giving good water- and solvent resistance after curing by ultraviolet light (UV) or electron beam (EB). 收起 | Request Sample |
