| Cold Process - Aftershave Lotion (Formulation #SC-GB/07/06B) | BASF | Cold Process - Aftershave Lotion (Formulation #SC-GB/07/06B) contains the ingredients Emulgade® CM, glycerin, Cosmedia® SP, Keltrol T, water, ethanol, preservative, and perfume. | ||
| Sensitive After Shave Balsam (Formulation #15532) | Sasol Chemicals 沙索化学品 | Shaving causes irritation and burning of the skin. Rapid relief is important to reduce irritation and take full advantage of the care properties. Based on Sasol's raw materials such as CERALUTION H RSPO-MB, NAFOL 1618 H, COSMACOL EMI, COSMACOL ELI, COSMAC...view more Shaving causes irritation and burning of the skin. Rapid relief is important to reduce irritation and take full advantage of the care properties. Based on Sasol's raw materials such as CERALUTION H RSPO-MB, NAFOL 1618 H, COSMACOL EMI, COSMACOL ELI, COSMACOL ECL and PARAFOL 14 RSPO-MB, we have formulated a sensitive after-shave balm that meets all requirements for shaved skin. view less |
