AMPHOTENSID AB-RSPO-MB | Zschimmer & Schwarz |
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AMPHOTENSID AB-RSPO-MB is a universal amphoteric surfactant used in cosmetic products. If it is used in combination with anionic surfactants, it improves the dermatological properties of the formulation, increasing also foam and viscosity.
Compliance Highlights Unavailable
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AMPHOTENSID B4/C | Zschimmer & Schwarz |
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AMPHOTENSID B4/C is the standard amphoteric surfactant that helps to decrease the aggressiveness of primary sulfate surfactant. Thank’s to its amphoteric character, it does not have incompatibilities with any surfactants. Possible to be used as a primary ...view more
AMPHOTENSID B4/C is the standard amphoteric surfactant that helps to decrease the aggressiveness of primary sulfate surfactant. Thank’s to its amphoteric character, it does not have incompatibilities with any surfactants. Possible to be used as a primary surfactant in sulfate-free formulations. view less
Compliance Highlights Unavailable
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AMPHOTENSID B4/C RSPO-MB | Zschimmer & Schwarz |
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AMPHOTENSID B4/C RSPO-MB is the standard amphoteric surfactant that helps to decrease aggressivity of primary sulfate surfactant. Thanks to its amphoteric character, it does not have incompatibilities with any surfactants. Possible to be used as a primary...view more
AMPHOTENSID B4/C RSPO-MB is the standard amphoteric surfactant that helps to decrease aggressivity of primary sulfate surfactant. Thanks to its amphoteric character, it does not have incompatibilities with any surfactants. Possible to be used as a primary surfactant in a sulfate-free formulations. view less
Compliance Highlights Unavailable
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AMPHOTENSID B4/CONC-I | Zschimmer & Schwarz |
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AMPHOTENSID B4/CONC-I is high concentration version of Cocamidopropyl Betaine, a universal amphoteric surfactant used in cosmetic and detergent products. If it is used in combination with anionic surfactants, it improves the dermatological properties of t...view more
AMPHOTENSID B4/CONC-I is high concentration version of Cocamidopropyl Betaine, a universal amphoteric surfactant used in cosmetic and detergent products. If it is used in combination with anionic surfactants, it improves the dermatological properties of the formulation, increasing also foam and viscosity. view less
Compliance Highlights Unavailable
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iMOST TMG | KimiKa, LLC (Formerly Cosphatech) |
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iMOST TMG is a highly purified source of anhydrous betaine, naturally occurring in biological tissue, is the natural moisturizing factor ( NMF ) of a component; Superior moisturizing, and feel particularly fresh, the permeability of the skin rapidly, givi...view more
iMOST TMG is a highly purified source of anhydrous betaine, naturally occurring in biological tissue, is the natural moisturizing factor ( NMF ) of a component; Superior moisturizing, and feel particularly fresh, the permeability of the skin rapidly, giving skin moist; It can be added in lotion, cream, oral care products, shampoo, body wash, and cleaning products. view less
Compliance Highlights Available
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iSURF BETAINE | KimiKa, LLC (Formerly Cosphatech) |
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iSURF BETAINE is used as a foam booster in shampoos. It is a medium strength surfactant also used in bath products like hand soaps. It is also used in cosmetics as an emulsifying agent and thickener, and to reduce irritation purely ionic surfactants would...view more
iSURF BETAINE is used as a foam booster in shampoos. It is a medium strength surfactant also used in bath products like hand soaps. It is also used in cosmetics as an emulsifying agent and thickener, and to reduce irritation purely ionic surfactants would cause. It also serves as an antistatic agent in hair conditioners. view less
Compliance Highlights Available
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iSURF SHD | KimiKa, LLC (Formerly Cosphatech) |
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iSURF SHD is a new mild amphoteric surfactant with low salt, low irritation, resistance to hard-water and anti-calcium soap.
Compliance Highlights Available
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iSURF SHD 50 | KimiKa, LLC (Formerly Cosphatech) |
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iSURF SHD 50 is a new mild amphoteric surfactant with low salt, low irritation, resistance to hard-water and anti-calcium soap.
Compliance Highlights Available
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