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RAHN is a leading global supplier of UV/EB curing raw materials for the Graphic Arts and Inks Industry. RAHN also developed lines of additives, oligomers, reactive diluents, and photoinitiators that enhance UV/EB-curing, also known as Energy Curing. Rahn’s EnergyCuring products enable faster curing times which result in quicker production and no use of volatile organic compounds (VOC).
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GENOCURE* EMK Rahn USA Corp. GENOCURE* EMK offers formulation options for faster, more effective curing with long wave UV and is well suitable for UV/LED application. It is a photoinitiator for UV-curable inks, coatings, and adhesives. Because it has both Type II and alkyl amine fun...Vea Mas GENOCURE* EMK offers formulation options for faster, more effective curing with long wave UV and is well suitable for UV/LED application. It is a photoinitiator for UV-curable inks, coatings, and adhesives. Because it has both Type II and alkyl amine functionality, GENOCURE* EMK can be used either with or without supplementary photoinitiators and amine synergists. This product is recommended for offset inks, letterpress inks, screen inks, flexo inks, wood applications, and UV/LED inks and varnishes that can tolerate some yellow color. Vea Menos Request Sample
GENOMER* 5271 Rahn USA Corp. GENOMER* 5271 is a moderate viscosity amino acrylate oligomer with fast cure response, excellent flexibility, high gloss, low yellowing and TOLUENE-FREE. It is an acrylated amine resin with particular utility in UV and EB free radical inks, coatings and a...Vea Mas GENOMER* 5271 is a moderate viscosity amino acrylate oligomer with fast cure response, excellent flexibility, high gloss, low yellowing and TOLUENE-FREE. It is an acrylated amine resin with particular utility in UV and EB free radical inks, coatings and adhesives. GENOMER* 5271 contributes to excellent cure response, toughness, flexibility and adhesion. Unlike conventional amine synergists, GENOMER* 5271 reacts to become part of the product network, leading to lower odor, lower extractables and better overall properties. Vea Menos Request Sample