SENSICARE C 3400 is a broad-spectrum preservative for cosmetics specifically developed for controlling bacterial, fungal, and yeasticidal growth. Preservative for cosmetics based on benzyl alcohol, sorbic acid, and benzoic acid. Low-toxicity cosmetic preservative. SENSICARE C 3400 is suitable for formaldehyde-free cosmetics. The cosmetic preservative is soluble in both emulsion phases. Cosmetic preservatives are appropriate for protecting cosmetics and personal care formulations such as emulsions, creams, lotions, and gels. Suitable for rinse-off and leave-on products.
| Name (CAS Number) | |
|---|---|
| Benzoic acid (65-85-0) | Sign in to view |
| Benzyl alcohol (100-51-6) | Sign in to view |
| Sorbic acid (110-44-1) | Sign in to view |
The following lists represent a selection of UL's ChemADVISOR™ Regulatory Database, curated for Prospector in Compliance Highlights. Need more context for understanding these highlights? We recommend UL's Navigator, your gateway to regulatory compliance (free trial available).
| Name (CAS Number) | |
|---|---|
|
Benzoic acid (65-85-0)
|
Sign in to view |
|
Benzyl alcohol (100-51-6)
|
Sign in to view |
|
Sorbic acid (110-44-1)
|
Sign in to view |
CHEMIPOL is a chemical company developing, manufacturing and distributing chemical specialties around the globe since 1979. CHEMIPOL expertise areas cover Paints and Coatings and Personal Care and Cosmetic Industries, including both industrial biocides and cosmetic preservatives and a wide range of additives for water based chemical products.
CHEMIPOL’s extensive portfolio offers diverse alternatives for additives needed in PCC industry: Cosmetic traditional preservatives (BIOPOL®), sustainable and low toxicity preservatives (SENSICARE®) and thickeners and opacifiers (ACRIPOL®).
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The following lists represent a selection of UL's ChemADVISOR™ Regulatory Database, curated for Prospector in Compliance Highlights. Need more context for understanding these highlights? We recommend UL's Navigator, your gateway to regulatory compliance (free trial available).
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